Calculated based on number of publications stored in Pure and citations from Scopus
1979 …2024

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  • 2018

    Novel Sn-based photoresist for high aspect ratio patterning

    Li, M., Manichev, V., Yu, F., Hutchison, D., Nyman, M., Gustafsson, T., Feldman, L. C. & Garfunkel, E. L., 2018, Advances in Patterning Materials and Processes XXXV. Hohle, C. K. (ed.). SPIE, 105860K. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 10586).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    8 Scopus citations
  • 2016

    Helium ion beam lithography (HIBL) using HafSOx as the resist

    Luo, F., Manichev, V., Li, M., Mitchson, G., Yakshinskiy, B., Gustafsson, T., Johnson, D. & Garfunkel, E., 2016, Advances in Patterning Materials and Processes XXXIII. Younkin, T. R. & Hohle, C. K. (eds.). SPIE, 977928. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 9779).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    12 Scopus citations
  • Optimizing "artificial leaf photoanode-photocathode-catalyst interface systems for solar water splitting

    Porter, S. H., Hwang, S., Amarasinghe, V., Taghaddos, E., Manichev, V., Li, M., Gardner, G., Safari, A., Garfunkel, E., Greenblatt, M. & Dismukes, G. C., 2016, Renewable Fuels via Artificial Photosynthesis or Electrolysis. Wu, N., Chu, D., Dinh, H., Miller, E., Subramanian, V., Manivannan, A., Kulesza, P. J., Wang, H. & Lee, J.-J. (eds.). 37 ed. Electrochemical Society Inc., p. 1-19 19 p. (ECS Transactions; vol. 72, no. 37).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    5 Scopus citations
  • Thin film catalysts: Ni5P4 (Cathodic) and LiCoO2 (Anodic) for electrolysis of water

    Hwang, S., Porter, S. H., Gardner, G., Laursen, A. B., Wang, H., Li, M., Amarasinghe, V., Taghaddos, E., Safari, A., Garfunkel, E., Greenblatt, M. & Dismukes, G. C., 2016, Hydrogen and Oxygen Evolution Catalysis for Water Electrolysis 2. Xu, H., Shao-Horn, Y., Ramani, V. K. & Kulesza, P. J. (eds.). 23 ed. Electrochemical Society Inc., p. 31-51 21 p. (ECS Transactions; vol. 72, no. 23).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Scopus citations
  • 2014

    Advancements in SiC power devices using novel interface passivation processes

    Sharma, Y. K., Ahyi, A. C., Issacs-Smith, T., Modic, A., Xu, Y., Garfunkel, E., Jennings, M. R., Fisher, C., Thomas, S. M., Fan, L., Mawby, P., Dhar, S., Feldman, L. C. & Williams, J. R., 2014, Physics of Semiconductor Devices - 17th International Workshop on the Physics of Semiconductor Devices, 2013. Jain, V. K. & Verma, A. (eds.). Springer Science and Business Media Deutschland GmbH, p. 47-52 6 p. (Environmental Science and Engineering).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • Thin PSG process for 4H-SiC MOSFET

    Sharma, Y. K., Ahyi, A. C., Issacs-Smith, T., Modic, A., Xu, Y., Garfunkel, E., Jennings, M. R., Fisher, C., Thomas, S. M., Mawby, P., Dhar, S., Feldman, L. C. & Williams, J. R., 2014, Silicon Carbide and Related Materials 2013. Okumura, H., Okumura, H., Harima, H., Kimoto, T., Yoshimoto, M., Watanabe, H., Hatayama, T., Matsuura, H., Sano, Y. & Funaki, T. (eds.). Trans Tech Publications Ltd, p. 513-516 4 p. (Materials Science Forum; vol. 778-780).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    3 Scopus citations
  • 2012

    The effects of phosphorus at the SiO2/4H-SiC interface

    Sharma, Y. K., Ahyi, A. C., Issacs-Smith, T., Shen, X., Pantelides, S. T., Zhu, X., Rozen, J., Feldman, L. C., Williams, J. R., Xu, Y. & Garfunkel, E., 2012, Silicon Carbide and Related Materials 2011, ICSCRM 2011. Devaty, R. P., Dudley, M., Chow, T. P. & Neudeck, P. G. (eds.). Trans Tech Publications Ltd, p. 743-746 4 p. (Materials Science Forum; vol. 717-720).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Scopus citations
  • 2010

    Electron spectroscopic measurements of band alignment in metal/oxide/semiconductor stacks

    Rangan, S., Bersch, E., Bartynski, R. A., Garfunkel, E. & Vescovo, E., 2010, Physics and Technology of High-k Materials 8. 3 ed. Electrochemical Society Inc., p. 267-279 13 p. (ECS Transactions; vol. 33, no. 3).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • 2007

    Gate metal-induced diffusion and interface reactions in Hf oxide films on Si

    Goncharova, L. V., Dalponte, M., Celik, O., Garfunkel, E., Gustafsson, T., Lysaght, P. S. & Bersuker, G. I., 2007, CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007 International Conference on Frontiers of Characterization and Metrology. p. 324-328 5 p. (AIP Conference Proceedings; vol. 931).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Scopus citations
  • Interface characterization in III-V CMOS nanoelectronics

    Goncharova, L. V., Celik, O., Gustafsson, T., Garfunkel, E., Warusawithana, M., Schlom, D. G., Wen, H., Santos, M. B., Sayan, S., Tsai, W. & Goel, N., 2007, ECS Transactions - 5th International Symposium on High Dielectric Constant Materials and Gate Stacks. 4 ed. Electrochemical Society Inc., p. 117-122 6 p. (ECS Transactions; vol. 11, no. 4).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Scopus citations
  • Ion profiling of implanted dopants in Si (001) with excess vacancy concentration

    Dalponte, M., Boudinov, H., Goncharova, L. V., Feng, T., Garfunkel, E. & Gustafsson, T., 2007, CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS: 2007 International Conference on Frontiers of Characterization and Metrology. p. 137-141 5 p. (AIP Conference Proceedings; vol. 931).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Scopus citations
  • MEIS study of Sb implantation in O or N pre-implanted Si(001) and SIMOX

    Dalponte, M., Boudinov, H., Goncharova, L. V., Garfunkel, E. & Gustafsson, T., 2007, 21st International Symposium on Microelectronics Technology and Devices, SBMicro 2006. 1 ed. Electrochemical Society Inc., p. 433-441 9 p. (ECS Transactions; vol. 4, no. 1).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • 2006

    Materials and processes for high k gate stacks: Results from the FEP transition center

    Osburn, C. M., Campbell, S. A., Demkov, A., Eisenbraun, E., Garfunkel, E., Gustafsson, T., Kingon, A. I., Lee, J., Lichtenwalner, D. J., Lucovsky, G., Ma, T. P., Maria, J. P., Misra, V., Nemanich, R. J., Parsons, G. N., Schlom, D. G., Stemmer, S., Wallace, R. M. & Whitten, J., 2006, Physics and Technology of High-k Gate Dielectrics 4. 3 ed. Electrochemical Society Inc., p. 389-415 27 p. (ECS Transactions; vol. 3, no. 3).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    3 Scopus citations
  • 2005

    The relation between crystalline phase, electronic structure, and dielectric properties in high-K gate stacks

    Sayan, S., Croft, M., Nguyen, N. V., Emge, T., Ehrstein, J., Levin, I., Suehle, J., Bartynski, R. A. & Garfunkel, E., Sep 9 2005, CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY 2005 - International Conference. p. 92-101 10 p. (AIP Conference Proceedings; vol. 788).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Open Access
    4 Scopus citations
  • 2003

    Interface composition and band alignment issues in high-K gate stacks

    Sayan, S., Goncharova, L., Starodub, D., Bartynski, R. A., Zhao, X., Vanderbilt, D., Gustafsson, T. & Garfunkel, E., 2003, 2003 International Semiconductor Device Research Symposium, ISDRS 2003 - Proceedings. Institute of Electrical and Electronics Engineers Inc., p. 26 1 p. 1271978. (2003 International Semiconductor Device Research Symposium, ISDRS 2003 - Proceedings).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

  • 2002

    Advances in high & kappa gate dielectrics for Si and III-V semiconductors

    Kwo, J., Hong, M., Busch, B., Muller, D. A., Chabal, Y. J., Kortan, A. R., Mannaerts, J. P., Yang, B., Ye, P., Gossmann, H., Sergent, A. M., Ng, K. K., Bude, J., Schulte, W. H., Garfunkel, E. & Gustafsson, T., 2002, MBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy. Institute of Electrical and Electronics Engineers Inc., p. 47-48 2 p. 1037753. (MBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Scopus citations
  • 1994

    On the mechanism of ultra thin silicon oxide film growth during thermal oxidation

    Gusev, E. P., Lu, H. C., Gustafsson, T. & Garfunkel, E., 1994, Interface Control of Electrical, Chemical, and Mechanical Properties. Borgesen, P., Jensen, K. F. & Pollak, R. A. (eds.). Publ by Materials Research Society, p. 69-74 6 p. (Materials Research Society Symposium Proceedings; vol. 318).

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    5 Scopus citations