Abstract
Commercial availability of high spatial resolution STEM instruments is leading to widespread use of EELS and ADF imaging techniques. Future instruments will need to greatly improve levels of stability and accuracy to allow use of these techniques with atomic level precision. I review some experimental results which suggest an urgent need for a 0.1 nm diameter probe with a usable EELS spectral resolution of about 100 meV.
Original language | English (US) |
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Pages (from-to) | 33-42 |
Number of pages | 10 |
Journal | Ultramicroscopy |
Volume | 78 |
Issue number | 1-4 |
DOIs | |
State | Published - Jun 1999 |
Externally published | Yes |
Event | Proceedings of the 1998 International Workshop Towards Atomic Resolution Analysis, TARA '98 Part 1 : Techniques and Instrumentation - Port Ludlow, WA, USA Duration: Sep 6 1998 → Sep 11 1998 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Instrumentation
Keywords
- Atomic level analysis
- EELS and ADF imaging techniques
- STEM instruments