Keyphrases
Oxynitride
100%
Photoelectrochemical Applications
100%
SrNbO2N
100%
Optical Quality
50%
Photoabsorber
50%
Absorption Length
50%
Carrier Diffusion Length
50%
In Tandem
25%
Low Temperature
25%
High Temperature
25%
Device Performance
25%
Ultrathin
25%
Perovskite Oxynitrides
25%
Wide Bandgap
25%
Film Thickness
25%
Interfacial Layer
25%
Low Barrier
25%
Photoelectrochemical Cell
25%
Si(100) Surface
25%
Interdiffusion
25%
Nonlinear Dependence
25%
Varying Thickness
25%
Single-crystal Substrate
25%
N-Si
25%
Bandgap Tunability
25%
Stoichiometric Compounds
25%
Junction Device
25%
Tunable Thickness
25%
Photovoltage
25%
Photoelectrochemical Activity
25%
Photocurrent Density
25%
Sacrificial Electron Donor
25%
Tandem Junction
25%
Tantalum Nitride
25%
Photoelectrochemical Performance
25%
Tandem Structure
25%
Roughness Factor
25%
Film Roughness
25%
Material Science
Silicon
100%
Thin Films
100%
Oxynitride
100%
Film
20%
Density
20%
Photoelectrochemical Cell
20%
Nitride Compound
20%
Film Thickness
20%
Tantalum
20%
Surface (Surface Science)
20%
Single Crystal
20%