Ferromagnetic Anomalous Hall Effect in Cr-Doped Bi2Se3 Thin Films via Surface-State Engineering

Jisoo Moon, Jinwoong Kim, Nikesh Koirala, Maryam Salehi, David Vanderbilt, Seongshik Oh

Research output: Contribution to journalArticlepeer-review

14 Scopus citations

Abstract

The anomalous Hall effect (AHE) is a nonlinear Hall effect appearing in magnetic conductors, boosted by internal magnetism beyond what is expected from the ordinary Hall effect. With the recent discovery of the quantized version of the AHE, the quantum anomalous Hall effect (QAHE), in Cr- or V-doped topological insulator (TI) (Sb,Bi)2Te3 thin films, the AHE in magnetic TIs has been attracting significant interest. However, one of the puzzles in this system has been that while Cr- or V-doped (Sb,Bi)2Te3 and V-doped Bi2Se3 exhibit AHE, Cr-doped Bi2Se3 has failed to exhibit even ferromagnetic AHE, the expected predecessor to the QAHE, though it is the first material predicted to exhibit the QAHE. Here, we have successfully implemented ferromagnetic AHE in Cr-doped Bi2Se3 thin films by utilizing a surface state engineering scheme. Surprisingly, the observed ferromagnetic AHE in the Cr-doped Bi2Se3 thin films exhibited only a positive slope regardless of the carrier type. We show that this sign problem can be explained by the intrinsic Berry curvature of the system as calculated from a tight-binding model combined with a first-principles method.

Original languageEnglish (US)
Pages (from-to)3409-3414
Number of pages6
JournalNano Letters
Volume19
Issue number6
DOIs
StatePublished - Jun 12 2019

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • General Chemistry
  • General Materials Science
  • Condensed Matter Physics
  • Mechanical Engineering

Keywords

  • BiSe
  • Chern number
  • Topological insulator
  • anomalous Hall effect
  • ferromagnetism

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