Grain boundary-solute interactions in polycrystalline silicon and germanium

D. A. Smith, C. R.M. Grovenor, P. E. Batson, C. Wong

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The behavior of semiconductors is affected by the presence and distribution of dopants. The properties involved range from electrical resistivity and carrier concentration to gain boundary mobility and self-diffusion. Understanding these phenomena necessitates the characterization of defect structure and chemistry. STEM analysis has been applied to the measurement of arsenic segregation to silicon grain boundaries. Quantitative information on the boundary concentration of arsenic has been obtained both on as-deposited and annealed polysilicon specimens. In addition, the dynamic interaction of solutes with grain boundaries in polycrystalline germanium has been investigated.

Original languageEnglish (US)
Pages (from-to)131-134
Number of pages4
JournalUltramicroscopy
Volume14
Issue number1-2
DOIs
StatePublished - 1984
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Instrumentation

Fingerprint

Dive into the research topics of 'Grain boundary-solute interactions in polycrystalline silicon and germanium'. Together they form a unique fingerprint.

Cite this