Heat transfer effects in the Chemical Vapor Deposition (CVD) manufacturing process are numerically modeled. A computational method is employed in which the multiple, coupled partial differential equations governing fluid flow and heat transfer are solved simultaneously, using a finite volume technique with a solution procedure similar to the SIMPLER algorithm. A non-uniform staggered grid system with nonorthogonal grid transformation is implemented to accurately model irregular reactor geometries. The investigation considers different forms of susceptor heating, including susceptor regions heated isothermally or by a constant heat flux. Issues concerning buoyancy and a moving susceptor for continuous processing are addressed. Conjugate heat transfer aspects that arise for several materials and thermal conditions employed in practice are considered, demonstrating the importance of diffusion in the solid domain. The model is able to predict the heat transfer rate and the susceptor temperature uniformity. These aspects are linked to the rate and quality of deposition, thus leading to reduced manufacturing costs and higher quality products. The study focuses on the heat transfer in the reactor and is the first step in the simulation of the entire process involving chemical reactions and mass transfer in addition to thermal transport. The implication of the present work with respect to complete modeling of the process are also discussed.
|Original language||English (US)|
|Number of pages||10|
|Journal||American Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD|
|State||Published - 1997|
All Science Journal Classification (ASJC) codes
- Mechanical Engineering
- Fluid Flow and Transfer Processes