High Resolution Techniques for the Fabrication of Small Area Josephson Tunnel Junctions

Evelyn L. Hu, Lawrence D. Jackel, Richard Howard

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Superconducting tunnel junction devices as small as 10–10 cm2have been made using novel self-aligning techniques in conjunction with optical or e-beam lithography. This process has been used to fabricate complete circuits and multijunction arrays under well controlled conditions, using a single resist patterning step.

Original languageEnglish (US)
Pages (from-to)1382-1385
Number of pages4
JournalIEEE Transactions on Electron Devices
Volume28
Issue number11
DOIs
StatePublished - Jan 1 1981
Externally publishedYes

Fingerprint

Tunnel junctions
Lithography
Fabrication
Networks (circuits)

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Cite this

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abstract = "Superconducting tunnel junction devices as small as 10–10 cm2have been made using novel self-aligning techniques in conjunction with optical or e-beam lithography. This process has been used to fabricate complete circuits and multijunction arrays under well controlled conditions, using a single resist patterning step.",
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High Resolution Techniques for the Fabrication of Small Area Josephson Tunnel Junctions. / Hu, Evelyn L.; Jackel, Lawrence D.; Howard, Richard.

In: IEEE Transactions on Electron Devices, Vol. 28, No. 11, 01.01.1981, p. 1382-1385.

Research output: Contribution to journalArticle

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