Abstract
Superconducting tunnel junction devices as small as 10–10 cm2have been made using novel self-aligning techniques in conjunction with optical or e-beam lithography. This process has been used to fabricate complete circuits and multijunction arrays under well controlled conditions, using a single resist patterning step.
Original language | English (US) |
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Pages (from-to) | 1382-1385 |
Number of pages | 4 |
Journal | IEEE Transactions on Electron Devices |
Volume | 28 |
Issue number | 11 |
DOIs | |
State | Published - Nov 1981 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering