Highly tetrahedral amorphous carbon films with low stress

M. Chhowalla, Y. Yin, G. A.J. Amaratunga, D. R. McKenzie, Th Frauenheim

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We have deposited boronated highly tetrahedral amorphous carbon (ta-C:B) films with low stress using a filtered cathodic vacuum arc. The sp3 fraction, hardness, and resistivity were measured as a function of the ion energy and were found to reach a maximum above 50 eV for B concentrations of 2% and 4%. The most significant result we found was that highly tetrahedral a-C:B film (sp3 ≈ 80%) with low stress (1-3 GPa) with B concentrations up to 4% could be obtained. The B in the films was found to be predominantly (≈75%) sp2 bonded. Additionally, the stress in the films did not vary with the ion energy or sp3 fraction unlike in regular ta-C films.

Original languageEnglish (US)
Pages (from-to)2344-2346
Number of pages3
JournalApplied Physics Letters
Issue number16
StatePublished - Oct 14 1996

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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