In order to study the influence of the back barrier on the electron emission properties of tetrahedral amorphous carbon (ta-C), we have deposited identical films on p and n+ Si. The valence and conduction band offsets were measured for ta-C on p and n+ Si using in situ x-ray photoelectron spectroscopy and optical spectroscopy. From the band measurements it is shown that there is a substantial back barrier to emission. We show that for films having very similar properties, the electron emission can be influenced by the ta-C/Si heterojunction.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)