Intelligent control and diagnosis of Chemical etch processes

Yuval Lirov, Benjamin Melamed, Robert J.T. Morris

Research output: Contribution to conferencePaperpeer-review

Abstract

Chemical etching is sensitive to a number of process variables which need to be maintained in a certain relationship to achieve good quality product. We describe an intelligent control system to support chemical etch processes. The system serves simultaneously two purposes: first it dispenses on-line expert advice on how to control chemical etching and, secondly, it constitutes a repository of qualitative knowledge and thus serves to codify the folklore of alkaline etch control. The expert system has been prototyped using PROLOG and installed on the factory floor.

Original languageEnglish (US)
Pages889-891
Number of pages3
DOIs
StatePublished - 1989
Externally publishedYes
Event1989 IEEE International Conference on Control and Applications, ICCON 1989 - Jerusalem, Israel
Duration: Apr 3 1989Apr 6 1989

Conference

Conference1989 IEEE International Conference on Control and Applications, ICCON 1989
Country/TerritoryIsrael
CityJerusalem
Period4/3/894/6/89

All Science Journal Classification (ASJC) codes

  • Process Chemistry and Technology
  • Artificial Intelligence
  • Control and Systems Engineering
  • Control and Optimization

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