Interaction of benzene and toluene vapors with Ru(0001) surface: Relevance to MLM contamination

B. V. Yakshinskiy, Q. Shen, R. A. Bartynski

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report studies of the thermal and non-thermal interaction of benzene and toluene vapors with the Ru(0001) surface, a model cap layer for multilayer mirrors (MLM), using temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), electron stimulated desorption (ESD), low electron energy diffraction (LEED), and scanning tunneling microscopy (STM). A low energy electron source (100 eV) is used to simulate radiation damage on the surface produced by EUV photons. Heating of adsorbed hydrocarbons leads to a stepwise dehydrogenation and buildup a self-limited carbon monolayer. Graphene monolayer and bilayer formation on Ru by hydrocarbon pyrolysis or by carbon segregation from the sample bulk is examined as a possible way to reduce the surface contamination rate. The binding energy of the hydrocarbon molecule is found to be smaller on a graphene layer than on disordered carbon. Electron bombardment of both bare and graphene covered Ru surface in the presence of benzene and toluene leads to C-buildup. However, the presence of a graphene monolayer on Ru surface reduces the electron-induced carbon growth rate at low electron flux conditions.

Original languageEnglish (US)
Title of host publicationExtreme Ultraviolet (EUV) Lithography II
DOIs
StatePublished - 2011
EventExtreme Ultraviolet (EUV) Lithography II - San Jose, CA, United States
Duration: Feb 28 2011Mar 3 2011

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7969
ISSN (Print)0277-786X

Other

OtherExtreme Ultraviolet (EUV) Lithography II
Country/TerritoryUnited States
CitySan Jose, CA
Period2/28/113/3/11

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Keywords

  • EUV optics contamination
  • Extreme ultraviolet lithography (EUVL)
  • benzene
  • carbon
  • electroninduced reactions
  • ruthenium
  • toluene

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