@inproceedings{1d94e38ec38b43c2b0c98ce0f467bc17,
title = "Interaction of benzene and toluene vapors with Ru(0001) surface: Relevance to MLM contamination",
abstract = "We report studies of the thermal and non-thermal interaction of benzene and toluene vapors with the Ru(0001) surface, a model cap layer for multilayer mirrors (MLM), using temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), electron stimulated desorption (ESD), low electron energy diffraction (LEED), and scanning tunneling microscopy (STM). A low energy electron source (100 eV) is used to simulate radiation damage on the surface produced by EUV photons. Heating of adsorbed hydrocarbons leads to a stepwise dehydrogenation and buildup a self-limited carbon monolayer. Graphene monolayer and bilayer formation on Ru by hydrocarbon pyrolysis or by carbon segregation from the sample bulk is examined as a possible way to reduce the surface contamination rate. The binding energy of the hydrocarbon molecule is found to be smaller on a graphene layer than on disordered carbon. Electron bombardment of both bare and graphene covered Ru surface in the presence of benzene and toluene leads to C-buildup. However, the presence of a graphene monolayer on Ru surface reduces the electron-induced carbon growth rate at low electron flux conditions.",
keywords = "EUV optics contamination, Extreme ultraviolet lithography (EUVL), benzene, carbon, electroninduced reactions, ruthenium, toluene",
author = "Yakshinskiy, {B. V.} and Q. Shen and Bartynski, {R. A.}",
year = "2011",
doi = "10.1117/12.879297",
language = "English (US)",
isbn = "9780819485281",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
booktitle = "Extreme Ultraviolet (EUV) Lithography II",
note = "Extreme Ultraviolet (EUV) Lithography II ; Conference date: 28-02-2011 Through 03-03-2011",
}