Investigation of carbon nitride films by cathodic arc evaporation

M. Chhowalla, I. Alexandrou, C. Kiely, G. A.J. Amaratunga, R. Aharonov, R. F. Fontana

Research output: Contribution to journalArticlepeer-review

37 Scopus citations


Presently there is great interest in deposition of the β-phase C3N4 because its predicted hardness and moduli exceed those of diamond. The use of energetic particle beam methods have shown promise in terms of nitrogen incorporation. Energetic and highly ionized beams from cathodic arcs have also proven to be effective in deposition of tetrahedral amorphous carbon (ta-C). In this paper we report on C-N films deposited using a carbon arc in nitrogen atmosphere. Films with nitrogen concentration ranging from 17-32% were deposited as a function of nitrogen pressure and substrate temperature. CNx films deposited above room temperature and 1 mTorr (0.013 Pa) of N2 were found to have low stress, indicating the presence of mostly sp2 bonding.

Original languageEnglish (US)
Pages (from-to)103-106
Number of pages4
JournalThin Solid Films
StatePublished - Dec 15 1996

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


  • Carbon nitride films
  • Cathodic arcs


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