Investigation of carbon nitride films by cathodic arc evaporation

M. Chhowalla; I. Alexandrou; C. Kiely; G. A.J. Amaratunga; R. Aharonov; R. F. Fontana

doi:10.1016/S0040-6090(96)09067-0

Investigation of carbon nitride films by cathodic arc evaporation

M. Chhowalla, I. Alexandrou, C. Kiely, G. A.J. Amaratunga, R. Aharonov, R. F. Fontana

School of Engineering, Materials Science & Engineering

Research output: Contribution to journal › Article › peer-review

37 Scopus citations

Abstract

Presently there is great interest in deposition of the β-phase C₃N₄ because its predicted hardness and moduli exceed those of diamond. The use of energetic particle beam methods have shown promise in terms of nitrogen incorporation. Energetic and highly ionized beams from cathodic arcs have also proven to be effective in deposition of tetrahedral amorphous carbon (ta-C). In this paper we report on C-N films deposited using a carbon arc in nitrogen atmosphere. Films with nitrogen concentration ranging from 17-32% were deposited as a function of nitrogen pressure and substrate temperature. CN_x films deposited above room temperature and 1 mTorr (0.013 Pa) of N₂ were found to have low stress, indicating the presence of mostly sp² bonding.

Original language	English (US)
Pages (from-to)	103-106
Number of pages	4
Journal	Thin Solid Films
Volume	290-291
DOIs	https://doi.org/10.1016/S0040-6090(96)09067-0
State	Published - Dec 15 1996

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Keywords

Carbon nitride films
Cathodic arcs

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10.1016/S0040-6090(96)09067-0

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title = "Investigation of carbon nitride films by cathodic arc evaporation",

abstract = "Presently there is great interest in deposition of the β-phase C3N4 because its predicted hardness and moduli exceed those of diamond. The use of energetic particle beam methods have shown promise in terms of nitrogen incorporation. Energetic and highly ionized beams from cathodic arcs have also proven to be effective in deposition of tetrahedral amorphous carbon (ta-C). In this paper we report on C-N films deposited using a carbon arc in nitrogen atmosphere. Films with nitrogen concentration ranging from 17-32% were deposited as a function of nitrogen pressure and substrate temperature. CNx films deposited above room temperature and 1 mTorr (0.013 Pa) of N2 were found to have low stress, indicating the presence of mostly sp2 bonding.",

keywords = "Carbon nitride films, Cathodic arcs",

author = "M. Chhowalla and I. Alexandrou and C. Kiely and Amaratunga, {G. A.J.} and R. Aharonov and Fontana, {R. F.}",

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doi = "10.1016/S0040-6090(96)09067-0",

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T1 - Investigation of carbon nitride films by cathodic arc evaporation

AU - Chhowalla, M.

AU - Alexandrou, I.

AU - Kiely, C.

AU - Amaratunga, G. A.J.

AU - Aharonov, R.

AU - Fontana, R. F.

PY - 1996/12/15

Y1 - 1996/12/15

N2 - Presently there is great interest in deposition of the β-phase C3N4 because its predicted hardness and moduli exceed those of diamond. The use of energetic particle beam methods have shown promise in terms of nitrogen incorporation. Energetic and highly ionized beams from cathodic arcs have also proven to be effective in deposition of tetrahedral amorphous carbon (ta-C). In this paper we report on C-N films deposited using a carbon arc in nitrogen atmosphere. Films with nitrogen concentration ranging from 17-32% were deposited as a function of nitrogen pressure and substrate temperature. CNx films deposited above room temperature and 1 mTorr (0.013 Pa) of N2 were found to have low stress, indicating the presence of mostly sp2 bonding.

AB - Presently there is great interest in deposition of the β-phase C3N4 because its predicted hardness and moduli exceed those of diamond. The use of energetic particle beam methods have shown promise in terms of nitrogen incorporation. Energetic and highly ionized beams from cathodic arcs have also proven to be effective in deposition of tetrahedral amorphous carbon (ta-C). In this paper we report on C-N films deposited using a carbon arc in nitrogen atmosphere. Films with nitrogen concentration ranging from 17-32% were deposited as a function of nitrogen pressure and substrate temperature. CNx films deposited above room temperature and 1 mTorr (0.013 Pa) of N2 were found to have low stress, indicating the presence of mostly sp2 bonding.

KW - Carbon nitride films

KW - Cathodic arcs

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EP - 106

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Investigation of carbon nitride films by cathodic arc evaporation

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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