Nano-holes in silicon wafers using laser-induced surface plasmon polaritons

Pal Molian, Un Zhiqun, Zou Qingze

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


Surface Plasmon Polaritons (SPPs) have been explored for a multitude of applications including sub-wavelength lithography, data storage, microscopy and photonics. In this paper, we report the use of SPPs for nanomachining silicon in massively parallel fashion. A Q-switched Nd:YAG laser beam was impinged on gold-thin film deposited, porous alumina membrane (PAM) that contains periodic 2-D array of thousands of nano-holes. The silicon substrate was placed in close proximity with PAM. The formation of SPPs and their coherent interference at the exit of RAM holes created strong nanoscale electrical fields which in turn produced 50-70 nm diameter holes in silicon.

Original languageEnglish (US)
Pages (from-to)2163-2166
Number of pages4
JournalJournal of Nanoscience and Nanotechnology
Issue number4
StatePublished - Apr 2008
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics


  • Nano-holes
  • Plasmon
  • Silicon wafers


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