Abstract
The fabrication of multiterminal silicon MOSFET's containing channel segments as narrow as 30 nm is described. These can be used for a variety of fundamental studies of quantum transport. In particular, in 100-nm channels, spatially localized voltage measurements can be made probing the scattering effects of a single electron trap.
Original language | English (US) |
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Pages (from-to) | 380-382 |
Number of pages | 3 |
Journal | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 4 |
Issue number | 1 |
DOIs | |
State | Published - Jan 1986 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering