Numerical simulation of a practical chemical vapor deposition reactor

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Abstract

Numerical simulation was set up to study a rotating vertical impinging chemical vapor deposition (CVD) system for the fabrication of thin films. It has been becoming very costly for manufacturers to produce high potent thin films due to the excessive waste of materials and high energy costs. A numerical study can be used to model and optimize the CVD reactor to yield favorable operating conditions. A simple geometry consisting of a rotating susceptor and flow guide is considered. The study shows visually how the temperature changes as the carrier gases respond to the thermal transport, and the effects of rotation and buoyancy. Commercially available software is used, with modifications, and the results obtained are discussed in detail.

Original languageEnglish (US)
Pages (from-to)1057-1071
Number of pages15
JournalNumerical Heat Transfer; Part A: Applications
Volume70
Issue number10
DOIs
StatePublished - Nov 16 2016

All Science Journal Classification (ASJC) codes

  • Numerical Analysis
  • Condensed Matter Physics

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