Performance of the Hampshire Instruments Model 5000 proximity x-ray stepper

John Frackoviak, George K. Celler, Charles W. Jurgensen, R. R. Kola, Anthony E. Novembre, Lee E. Trimble, David N. Tomes

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Scopus citations

Abstract

The Hampshire Instruments Model 5000 Stepper is a commercially available laser based 1:1 proximity x-ray stepper. The source of this system is a 25 watt Nd:glass slab laser which is focused to approximately 200 micrometers diameter spot on an iron alloy tape target. Nanosecond pulses fired at a 2 Hz burst (1 Hz average) repetition rate produce slightly more than 1 mJ/cm2 of x-ray flux per pulse at the wafer plane. This flux of soft x-ray has a spectrum of 8-20 angstroms centered on the 14 angstroms band. This is the first system shipped by Hampshire Instruments. It is a research and development tool which is not meant for the production line, but rather as a means to investigate issues associated with x-ray lithography and inserting a system of this type into a manufacturing environment. This paper will present final acceptance test results for system resolution, critical dimension control and registration, as well as data showing system performance for the first five months of operation. Results showing 0.2 micrometers line and space resolution across a 14.7 mm field in 1.0 micrometers thick resist printed using a tungsten absorber mask will be presented. Registration test results show a variation of 0.13 micrometers (3 (sigma)) across a five wafer lot. When the alignment system was slowed down, however, a result of 0.09 micrometers was achieved. Metrology issues dealing with critical dimension control as they pertain to this stepper will be addressed.

Original languageEnglish (US)
Title of host publicationElectron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III
EditorsDavid O. Patterson
PublisherSPIE
Pages258-272
Number of pages15
ISBN (Electronic)9780819411587
DOIs
StatePublished - Jun 24 1993
Externally publishedYes
EventElectron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III 1993 - San Jose, United States
Duration: Jan 28 1993Feb 5 1993

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume1924
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Other

OtherElectron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III 1993
CountryUnited States
CitySan Jose
Period1/28/932/5/93

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Performance of the Hampshire Instruments Model 5000 proximity x-ray stepper'. Together they form a unique fingerprint.

Cite this