Precipitation of group V elements and Ge in SiO2 and their drift in a temperature gradient

G. K. Celler, L. E. Trimble, T. T. Sheng, S. G. Kosinski, K. W. West

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

It is shown that P, Sb, and Ge ions implanted in SiO2 precipitate into spherical clusters of up to 1000 Å diameter when heat treated in an oxygen-free ambient. This behavior is similar to that reported earlier for As implants. The clusters can be detected directly by transmission electron microscopy, or inferred from the unidirectional drift of the doped zone in a temperature gradient. Boron, a representative of group III, is the only element among those tested that does not migrate in a ∇T, suggesting the absence of phase separation.

Original languageEnglish (US)
Pages (from-to)1178-1180
Number of pages3
JournalApplied Physics Letters
Volume53
Issue number13
DOIs
StatePublished - Dec 1 1988

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temperature gradients
precipitates
boron
heat
transmission electron microscopy
oxygen
ions

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

Cite this

Celler, G. K. ; Trimble, L. E. ; Sheng, T. T. ; Kosinski, S. G. ; West, K. W. / Precipitation of group V elements and Ge in SiO2 and their drift in a temperature gradient. In: Applied Physics Letters. 1988 ; Vol. 53, No. 13. pp. 1178-1180.
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Precipitation of group V elements and Ge in SiO2 and their drift in a temperature gradient. / Celler, G. K.; Trimble, L. E.; Sheng, T. T.; Kosinski, S. G.; West, K. W.

In: Applied Physics Letters, Vol. 53, No. 13, 01.12.1988, p. 1178-1180.

Research output: Contribution to journalArticle

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