Production of x-ray mask blanks for a point source stepper

L. E. Trimble, G. K. Celler, J. Frackoviak, A. Liddle, G. R. Weber

Research output: Contribution to journalConference article

1 Scopus citations

Abstract

Many requirements of a point-source x-ray membrane mask are different than for a synchrotron source. Membranes must be thinner, flatter and stronger, for example. We characterize our polysilicon and silicon-rich nitride membranes, and a simplified one-piece (monolithic) mask blank. We use two strength testing techniques which discern whether membrane strength is limited by defects in the film growth process, or defects in the attachment of membrane to support We find our membrane films are stronger than previously thought, and that improvements in membrane/support attachment will effect a more durable membrane mask.

Original languageEnglish (US)
Pages (from-to)317-323
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume1671
DOIs
Publication statusPublished - Jul 9 1992
Externally publishedYes
EventElectron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II 1992 - San Jose, United States
Duration: Mar 8 1992Mar 12 1992

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All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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