Abstract
Source oxidation of easily oxidizing elements such as Ca, Sr, Ba, and Ti in an oxidizing ambient leads to their flux instability and is one of the biggest problems in the multielemental oxide molecular beam epitaxy technique. Here, the authors report a new scheme that can completely eliminate the source oxidation problem: a self-gettering differential pump using the source itself as the pumping medium. The pump simply comprises a long collimator mounted in front of the source in extended port geometry. With this arrangement, the oxygen partial pressure near the source was easily maintained well below the source oxidation regime, resulting in a stabilized flux, comparable to that of an ultrahigh-vacuum environment. Moreover, this pump has a self-feedback mechanism that allows a stronger pumping effectiveness for more easily oxidizing elements, which is a desired property for eliminating the source oxidation problem.
| Original language | English (US) |
|---|---|
| Article number | 041505 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 29 |
| Issue number | 4 |
| DOIs | |
| State | Published - Jul 1 2011 |
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All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
Cite this
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Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment. / Kim, Yong Seung; Bansal, Namrata; Oh, Seongshik.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 29, No. 4, 041505, 01.07.2011.Research output: Contribution to journal › Article
TY - JOUR
T1 - Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment
AU - Kim, Yong Seung
AU - Bansal, Namrata
AU - Oh, Seongshik
PY - 2011/7/1
Y1 - 2011/7/1
N2 - Source oxidation of easily oxidizing elements such as Ca, Sr, Ba, and Ti in an oxidizing ambient leads to their flux instability and is one of the biggest problems in the multielemental oxide molecular beam epitaxy technique. Here, the authors report a new scheme that can completely eliminate the source oxidation problem: a self-gettering differential pump using the source itself as the pumping medium. The pump simply comprises a long collimator mounted in front of the source in extended port geometry. With this arrangement, the oxygen partial pressure near the source was easily maintained well below the source oxidation regime, resulting in a stabilized flux, comparable to that of an ultrahigh-vacuum environment. Moreover, this pump has a self-feedback mechanism that allows a stronger pumping effectiveness for more easily oxidizing elements, which is a desired property for eliminating the source oxidation problem.
AB - Source oxidation of easily oxidizing elements such as Ca, Sr, Ba, and Ti in an oxidizing ambient leads to their flux instability and is one of the biggest problems in the multielemental oxide molecular beam epitaxy technique. Here, the authors report a new scheme that can completely eliminate the source oxidation problem: a self-gettering differential pump using the source itself as the pumping medium. The pump simply comprises a long collimator mounted in front of the source in extended port geometry. With this arrangement, the oxygen partial pressure near the source was easily maintained well below the source oxidation regime, resulting in a stabilized flux, comparable to that of an ultrahigh-vacuum environment. Moreover, this pump has a self-feedback mechanism that allows a stronger pumping effectiveness for more easily oxidizing elements, which is a desired property for eliminating the source oxidation problem.
UR - http://www.scopus.com/inward/record.url?scp=79960553509&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79960553509&partnerID=8YFLogxK
U2 - 10.1116/1.3591384
DO - 10.1116/1.3591384
M3 - Article
AN - SCOPUS:79960553509
VL - 29
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SN - 0734-2101
IS - 4
M1 - 041505
ER -