Small-area high-current-density Josephson junctions

R. E. Howard; E. L. Hu; L. D. Jackel; L. A. Fetter; R. H. Bosworth

doi:10.1063/1.90991

Small-area high-current-density Josephson junctions

R. E. Howard, E. L. Hu, L. D. Jackel, L. A. Fetter, R. H. Bosworth

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Josephson junctions with areas of ∼10^-9 cm² and current densities of 10⁵ A/cm² are described. The junctions were patterned using a combination of optical lithography and oblique evaporation techniques. The junction width is limited by the lithographic resolution to about 1 μm. The junction length is determined essentially by the base-electrode film thickness and can be as small as 1000 Å. The moderate (∼10 Ω) normal resistances of these junctions combined with their short intrinsic RC times gives them potential for application in nonlatching Josephson logic and in quasiparticle mm-wave mixers.

Original language	English (US)
Pages (from-to)	879-881
Number of pages	3
Journal	Applied Physics Letters
Volume	35
Issue number	11
DOIs	https://doi.org/10.1063/1.90991
State	Published - 1979
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.90991

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title = "Small-area high-current-density Josephson junctions",

abstract = "Josephson junctions with areas of ∼10-9 cm2 and current densities of 105 A/cm2 are described. The junctions were patterned using a combination of optical lithography and oblique evaporation techniques. The junction width is limited by the lithographic resolution to about 1 μm. The junction length is determined essentially by the base-electrode film thickness and can be as small as 1000 {\AA}. The moderate (∼10 Ω) normal resistances of these junctions combined with their short intrinsic RC times gives them potential for application in nonlatching Josephson logic and in quasiparticle mm-wave mixers.",

author = "Howard, {R. E.} and Hu, {E. L.} and Jackel, {L. D.} and Fetter, {L. A.} and Bosworth, {R. H.}",

year = "1979",

doi = "10.1063/1.90991",

language = "English (US)",

volume = "35",

pages = "879--881",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "11",

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TY - JOUR

T1 - Small-area high-current-density Josephson junctions

AU - Howard, R. E.

AU - Hu, E. L.

AU - Jackel, L. D.

AU - Fetter, L. A.

AU - Bosworth, R. H.

PY - 1979

Y1 - 1979

N2 - Josephson junctions with areas of ∼10-9 cm2 and current densities of 105 A/cm2 are described. The junctions were patterned using a combination of optical lithography and oblique evaporation techniques. The junction width is limited by the lithographic resolution to about 1 μm. The junction length is determined essentially by the base-electrode film thickness and can be as small as 1000 Å. The moderate (∼10 Ω) normal resistances of these junctions combined with their short intrinsic RC times gives them potential for application in nonlatching Josephson logic and in quasiparticle mm-wave mixers.

AB - Josephson junctions with areas of ∼10-9 cm2 and current densities of 105 A/cm2 are described. The junctions were patterned using a combination of optical lithography and oblique evaporation techniques. The junction width is limited by the lithographic resolution to about 1 μm. The junction length is determined essentially by the base-electrode film thickness and can be as small as 1000 Å. The moderate (∼10 Ω) normal resistances of these junctions combined with their short intrinsic RC times gives them potential for application in nonlatching Josephson logic and in quasiparticle mm-wave mixers.

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U2 - 10.1063/1.90991

DO - 10.1063/1.90991

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SP - 879

EP - 881

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 11

ER -

Small-area high-current-density Josephson junctions

Abstract

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