Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
Wave Properties
100%
Epitaxial
100%
ZnO Film
100%
Surface Acoustic Wave
100%
Sapphire
100%
Structural Surface
100%
Structural-acoustic
100%
Aluminum Oxide
57%
Annealing
42%
Surface Acoustic Wave Devices
28%
R-sapphire
28%
Acousto-optic Modulator
28%
Low Loss
14%
Structural Properties
14%
Transmission Electron Microscopy
14%
Spinel
14%
Optical Properties
14%
Room Temperature
14%
Single Crystal
14%
Absorption Characteristics
14%
Active Materials
14%
Piezoelectric Properties
14%
Bulk Single Crystal
14%
Light Modulator
14%
High Contrast
14%
R-plane Sapphire
14%
As-grown
14%
Processing Temperature
14%
Full Width at Half Maximum
14%
Solid-state Reaction
14%
Epitaxial Relationship
14%
Sapphire Substrate
14%
Photoluminescence
14%
Photoluminescence Spectra
14%
Buffer Layer
14%
III-nitrides
14%
Solid-state Laser
14%
Effective Electromechanical Coupling Coefficient
14%
ZnAl2O4 Spinel
14%
Maximum Process
14%
α-Al2O3
14%
Band-edge Emission
14%
Physics
Single Crystal
100%
Acoustic Wave
100%
Spinel
100%
Metalorganic Chemical Vapor Deposition
100%
Surface Acoustic Wave Device
100%
Photoluminescence
100%
Room Temperature
50%
Transmission Electron Microscopy
50%
Piezoelectricity
50%
Coupling Coefficient
50%
Acousto-Optics
50%
Solid State Laser
50%
Nitride
50%
Optical Property
50%
Piezoelectricity
50%
Engineering
Piezoelectric
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Surface Acoustic Wave
100%
Surface Acoustic Wave Device
100%
Room Temperature
50%
Nitride
50%
Band Edge
50%
Coupling Coefficient
50%
Sapphire Substrate
50%
Ultraviolet Light
50%
State Reaction
50%
Active Material
50%
Buffer Layer
50%
State Laser
50%
Material Science
Film
100%
ZnO
100%
Chemical Vapor Deposition
100%
Sapphire
100%
Surface (Surface Science)
100%
Al2O3
35%
Photoluminescence
14%
Surface Acoustic Wave Device
14%
Single Crystal
14%
Optical Property
7%
Piezoelectricity
7%
Transmission Electron Microscopy
7%
Electromechanical Coupling
7%
Nitride Compound
7%
Piezoelectric Property
7%
Buffer Layer
7%
Solid-State Laser
7%