Sulfur adatom diffusion on the Cu(111) surface

B. J. Hinch, J. W.M. Frenken, G. Zhang, J. P. Toennies

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Abstract

This paper presents the first low-energy, quasi-elastic He-atom scattering study of adsorbate atom diffusion. At 820 K sulfur adatoms segregated onto the close-packed (111) surface of a copper crystal at a rate ∼ 0.01 ML/h. These adatoms produce significant diffuse intensity of scattered He and, as evident from the quasielastic energy broadening, are highly mobile. The diffusion coefficient (D = 2.9 × 10-5 cm2 s-1) exhibits no surface coverage dependence, indicating relatively weak sulfur-sulfur interactions on the Cu(111) substrate.

Original languageEnglish (US)
Pages (from-to)288-300
Number of pages13
JournalSurface Science
Volume259
Issue number3
DOIs
StatePublished - Dec 2 1991

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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