Metal-alkyl molecules adsorbed on chemically prepared silicon surfaces have been studied using infrared total-internal reflection and ultraviolet transmission spectroscopies, temperature-programmed desorption spectroscopy (TPD), and mass spectroscopy of laser induced desorption (LID) products. For chemisorbed species, the surface hydroxyl groups have been shown to be the prime adsorption sites. In addition, we determined the identity of the chemisorbed species and their fragments under ultraviolet photodissociation. Surface photodissociation was observed to be strongly wavelength dependent at 193 and 248 nm.
All Science Journal Classification (ASJC) codes
- Physics and Astronomy(all)
- Physical and Theoretical Chemistry