Surface photochemistry of divalent metal alkyls on SiO2

Ping S. Shaw; Esaul Sanchez; James A. O'Neill; Zhen Wu; B. M. Osgood

doi:10.1063/1.459968

Surface photochemistry of divalent metal alkyls on SiO₂

Ping S. Shaw, Esaul Sanchez, James A. O'Neill, Zhen Wu, B. M. Osgood

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Metal-alkyl molecules adsorbed on chemically prepared silicon surfaces have been studied using infrared total-internal reflection and ultraviolet transmission spectroscopies, temperature-programmed desorption spectroscopy (TPD), and mass spectroscopy of laser induced desorption (LID) products. For chemisorbed species, the surface hydroxyl groups have been shown to be the prime adsorption sites. In addition, we determined the identity of the chemisorbed species and their fragments under ultraviolet photodissociation. Surface photodissociation was observed to be strongly wavelength dependent at 193 and 248 nm.

Original language	English (US)
Pages (from-to)	1643-1652
Number of pages	10
Journal	The Journal of Chemical Physics
Volume	94
Issue number	2
DOIs	https://doi.org/10.1063/1.459968
State	Published - 1991
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy(all)
Physical and Theoretical Chemistry

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10.1063/1.459968

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abstract = "Metal-alkyl molecules adsorbed on chemically prepared silicon surfaces have been studied using infrared total-internal reflection and ultraviolet transmission spectroscopies, temperature-programmed desorption spectroscopy (TPD), and mass spectroscopy of laser induced desorption (LID) products. For chemisorbed species, the surface hydroxyl groups have been shown to be the prime adsorption sites. In addition, we determined the identity of the chemisorbed species and their fragments under ultraviolet photodissociation. Surface photodissociation was observed to be strongly wavelength dependent at 193 and 248 nm.",

author = "Shaw, {Ping S.} and Esaul Sanchez and O'Neill, {James A.} and Zhen Wu and Osgood, {B. M.}",

year = "1991",

doi = "10.1063/1.459968",

language = "English (US)",

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pages = "1643--1652",

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T1 - Surface photochemistry of divalent metal alkyls on SiO2

AU - Shaw, Ping S.

AU - Sanchez, Esaul

AU - O'Neill, James A.

AU - Wu, Zhen

AU - Osgood, B. M.

PY - 1991

Y1 - 1991

N2 - Metal-alkyl molecules adsorbed on chemically prepared silicon surfaces have been studied using infrared total-internal reflection and ultraviolet transmission spectroscopies, temperature-programmed desorption spectroscopy (TPD), and mass spectroscopy of laser induced desorption (LID) products. For chemisorbed species, the surface hydroxyl groups have been shown to be the prime adsorption sites. In addition, we determined the identity of the chemisorbed species and their fragments under ultraviolet photodissociation. Surface photodissociation was observed to be strongly wavelength dependent at 193 and 248 nm.

AB - Metal-alkyl molecules adsorbed on chemically prepared silicon surfaces have been studied using infrared total-internal reflection and ultraviolet transmission spectroscopies, temperature-programmed desorption spectroscopy (TPD), and mass spectroscopy of laser induced desorption (LID) products. For chemisorbed species, the surface hydroxyl groups have been shown to be the prime adsorption sites. In addition, we determined the identity of the chemisorbed species and their fragments under ultraviolet photodissociation. Surface photodissociation was observed to be strongly wavelength dependent at 193 and 248 nm.

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JO - The Journal of Chemical Physics

JF - The Journal of Chemical Physics

IS - 2

ER -

Surface photochemistry of divalent metal alkyls on SiO₂

Abstract

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