The role of secondary electrons in electron-assisted adsorption process

H. T. Liu; Z. Wu

doi:10.1016/0039-6028(93)90581-4

The role of secondary electrons in electron-assisted adsorption process

H. T. Liu, Z. Wu

Rutgers Newark, Physics

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

In an ultrahigh vacuum chamber in which the partial pressure of Cl containing residual gases was 10^-12 Torr, the entire surface of a Cu sample was found to be covered with Cl after a small area (0.1 mm diameter) of the sample surface was irradiated with an electron beam. This was shown to be caused by secondary electrons rather than by surface migration as was postulated to explain a previously observed similar phenomenon.

Original language	English (US)
Pages (from-to)	L685-L687
Journal	Surface Science
Volume	290
Issue number	1-2
DOIs	https://doi.org/10.1016/0039-6028(93)90581-4
State	Published - Jun 10 1993

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/0039-6028(93)90581-4

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@article{6b5a8af94447464abc32e759fe4347eb,

title = "The role of secondary electrons in electron-assisted adsorption process",

abstract = "In an ultrahigh vacuum chamber in which the partial pressure of Cl containing residual gases was 10-12 Torr, the entire surface of a Cu sample was found to be covered with Cl after a small area (0.1 mm diameter) of the sample surface was irradiated with an electron beam. This was shown to be caused by secondary electrons rather than by surface migration as was postulated to explain a previously observed similar phenomenon.",

author = "Liu, {H. T.} and Z. Wu",

note = "Funding Information: We wish to thank Professor R. Osgood for loaning us the Cu(ll1) sample. This work was supportedb y the NSF grant DMR-9022134.",

year = "1993",

month = jun,

day = "10",

doi = "10.1016/0039-6028(93)90581-4",

language = "English (US)",

volume = "290",

pages = "L685--L687",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "1-2",

}

TY - JOUR

T1 - The role of secondary electrons in electron-assisted adsorption process

AU - Liu, H. T.

AU - Wu, Z.

N1 - Funding Information: We wish to thank Professor R. Osgood for loaning us the Cu(ll1) sample. This work was supportedb y the NSF grant DMR-9022134.

PY - 1993/6/10

Y1 - 1993/6/10

N2 - In an ultrahigh vacuum chamber in which the partial pressure of Cl containing residual gases was 10-12 Torr, the entire surface of a Cu sample was found to be covered with Cl after a small area (0.1 mm diameter) of the sample surface was irradiated with an electron beam. This was shown to be caused by secondary electrons rather than by surface migration as was postulated to explain a previously observed similar phenomenon.

AB - In an ultrahigh vacuum chamber in which the partial pressure of Cl containing residual gases was 10-12 Torr, the entire surface of a Cu sample was found to be covered with Cl after a small area (0.1 mm diameter) of the sample surface was irradiated with an electron beam. This was shown to be caused by secondary electrons rather than by surface migration as was postulated to explain a previously observed similar phenomenon.

UR - http://www.scopus.com/inward/record.url?scp=0027609445&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0027609445&partnerID=8YFLogxK

U2 - 10.1016/0039-6028(93)90581-4

DO - 10.1016/0039-6028(93)90581-4

M3 - Article

AN - SCOPUS:0027609445

SN - 0039-6028

VL - 290

SP - L685-L687

JO - Surface Science

JF - Surface Science

IS - 1-2

ER -

The role of secondary electrons in electron-assisted adsorption process

Abstract

All Science Journal Classification (ASJC) codes

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