The structure and thermal behavior of Cu on ultrathin films of SiO2 on Si(111)

J. B. Zhou; T. Gustafsson; E. Garfunkel

doi:10.1016/S0039-6028(96)01100-4

The structure and thermal behavior of Cu on ultrathin films of SiO₂ on Si(111)

J. B. Zhou, T. Gustafsson, E. Garfunkel

Research output: Contribution to journal › Article › peer-review

29 Scopus citations

Abstract

A study of the structure of thin Cu coatings on ultrathin SiO₂ films grown on Si(111) is reported. Cu growth takes place in islands, and after annealing to 625 K or above, the Cu overlayer diffuses into the substrate. These results are similar to recently reported results for Ni overlayers. Unlike Ni, however, the Cu atoms occupy interstitial sites in the Si lattice.

Original language	English (US)
Pages (from-to)	21-27
Number of pages	7
Journal	Surface Science
Volume	372
Issue number	1-3
DOIs	https://doi.org/10.1016/S0039-6028(96)01100-4
State	Published - Feb 10 1997

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Keywords

Copper
Medium energy ion scattering (MEIS)
Nickel
Silicon
Silicon oxides

Access to Document

10.1016/S0039-6028(96)01100-4

Cite this

@article{743bfeb83f074023b3cadce94b2e2a0f,

title = "The structure and thermal behavior of Cu on ultrathin films of SiO2 on Si(111)",

abstract = "A study of the structure of thin Cu coatings on ultrathin SiO2 films grown on Si(111) is reported. Cu growth takes place in islands, and after annealing to 625 K or above, the Cu overlayer diffuses into the substrate. These results are similar to recently reported results for Ni overlayers. Unlike Ni, however, the Cu atoms occupy interstitial sites in the Si lattice.",

keywords = "Copper, Medium energy ion scattering (MEIS), Nickel, Silicon, Silicon oxides",

author = "Zhou, {J. B.} and T. Gustafsson and E. Garfunkel",

note = "Funding Information: This research was supported by the National Science Foundation through Grant No. DMR-9408578.",

year = "1997",

month = feb,

day = "10",

doi = "10.1016/S0039-6028(96)01100-4",

language = "English (US)",

volume = "372",

pages = "21--27",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "1-3",

}

TY - JOUR

T1 - The structure and thermal behavior of Cu on ultrathin films of SiO2 on Si(111)

AU - Zhou, J. B.

AU - Gustafsson, T.

AU - Garfunkel, E.

N1 - Funding Information: This research was supported by the National Science Foundation through Grant No. DMR-9408578.

PY - 1997/2/10

Y1 - 1997/2/10

N2 - A study of the structure of thin Cu coatings on ultrathin SiO2 films grown on Si(111) is reported. Cu growth takes place in islands, and after annealing to 625 K or above, the Cu overlayer diffuses into the substrate. These results are similar to recently reported results for Ni overlayers. Unlike Ni, however, the Cu atoms occupy interstitial sites in the Si lattice.

AB - A study of the structure of thin Cu coatings on ultrathin SiO2 films grown on Si(111) is reported. Cu growth takes place in islands, and after annealing to 625 K or above, the Cu overlayer diffuses into the substrate. These results are similar to recently reported results for Ni overlayers. Unlike Ni, however, the Cu atoms occupy interstitial sites in the Si lattice.

KW - Copper

KW - Medium energy ion scattering (MEIS)

KW - Nickel

KW - Silicon

KW - Silicon oxides

UR - http://www.scopus.com/inward/record.url?scp=0031075841&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031075841&partnerID=8YFLogxK

U2 - 10.1016/S0039-6028(96)01100-4

DO - 10.1016/S0039-6028(96)01100-4

M3 - Article

AN - SCOPUS:0031075841

SN - 0039-6028

VL - 372

SP - 21

EP - 27

JO - Surface Science

JF - Surface Science

IS - 1-3

ER -