Thin films of hard cubic Zr3N4 stabilized by stress

Manishkumar Chhowalla, H. Emrah Unalan

Research output: Contribution to journalArticlepeer-review

120 Scopus citations

Abstract

The realization and characterization of hard cubic Zr3N 4 (c-Zr3N4) thin films were discussed. The films, deposited using a novel but industrially viable modified filtered cathodic arc (FCA) method, undergo a phase transformation from orthorhombic to cubic above a critical stress level of 9 GPa as determined by X-ray diffraction and Raman spectroscopy. The c-Zr3N4 films were significantly harder (∼36 GPa) than both the orthorhombic Zr 3N4 and ZrN films (∼27 GPa). It was shown that the ability to deposit this material onto components as a thin film is expected to allow its use in wear- and oxidation-resistant applications.

Original languageEnglish (US)
Pages (from-to)317-322
Number of pages6
JournalNature Materials
Volume4
Issue number4
DOIs
StatePublished - Apr 2005

All Science Journal Classification (ASJC) codes

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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