Titanium and reduced titania overlayers on titanium dioxide(110)

J. T. Mayer, U. Diebold, T. E. Madey, E. Garfunkel

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The adsorption of titanium on titanium dioxide TiO2(110) has been studied by X-ray photoelectron spectroscopy (XPS) and low energy ion scattering (LEIS). The XPS data for Ti overlayers are interpreted using peak fitting based on experimental standard spectra. 4 Å of Ti deposited at 150 K reacts with the substrate to produce ≈ 12 Å of intermediate oxidation state Ti. Adsorption of neutral metal begins on top of this interface oxide film, but 20 Å of deposited Ti are needed to cover the oxide completely. LEIS data indicate a tendency for clustering of Ti on top of the interface oxide. Ar+ sputtering of stoichiometric TiO2 leads to preferential loss of O from the near surface region. This reduction of the clean, annealed oxide surface by Ar+ ion bombardment starts immediately and does not reach a steady state until 3 × 1017 ions cm-2, at which point the reduced overlayer is 17 Å thick.

Original languageEnglish (US)
Pages (from-to)1-11
Number of pages11
JournalJournal of Electron Spectroscopy and Related Phenomena
Issue number1
StatePublished - May 31 1995

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Radiation
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Spectroscopy
  • Physical and Theoretical Chemistry


  • Low energy ion scattering
  • TiO(110)
  • Titania
  • Titanium
  • X-ray photoelectron spectroscopy


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